| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_95585944cd76ddfb6dc33ed2a0b84403 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2602-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-732
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F38-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L65-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F38-00 |
| filingDate |
2006-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52917f7f255c5e2a6e0db11cba51dee3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90947e2f1eed8f380ce5169409a52ab0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0203c6a83a32cdf7ab40c725d986a288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f76558e89c3e0f9bad5be615f1f6e03 |
| publicationDate |
2008-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101180324-A |
| titleOfInvention |
Polymerizable compound for photoresist, polymer thereof, and photoresist composition containing such polymer |
| abstract |
The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer. |
| priorityDate |
2005-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |