| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2035-0827
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C35-0888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2059-023 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C59-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-3842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-424
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C35-0888 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 |
| filingDate |
2007-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea413aa28414951ca53091d8a7b3514b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c51ea17ebc85011abb351539d1827218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f310add5c995466b0a09bab21db78249
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1ca7344b464f9308bdfff8ef0102ae4 |
| publicationDate |
2013-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-101144977-B |
| titleOfInvention |
Mold for nano-imprinting and method of manufacturing the same |
| abstract |
A nano-imprint mold and a method of manufacturing the same are provided, which can be used for replicating a nano-scaled structure to a polymer film. The nano-imprint mold comprises: a substrate made of materials capable of across ultraviolet rays; a pattern portion having a prominence and depression pattern formed on the substrate and made of ultraviolet ray cured polymers; a hard layer formed of a material with a hardness higher than the pattern portion on a surface of the pattern portion; and a separation layer formed on a surface of the hard layer and assisting to separate the polymers therefrom. In the nano-imprint mold of the present invention, an original pattern can be uniformly replicated even on a substrate with an irregular surface. Further, the pattern can be prevented from being damaged by pressure and being contaminated by synthetic resin, resulting in better accuracy and durability of the pattern. |
| priorityDate |
2006-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |