| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2003-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78528f3d82141b2bbf5b160b0e228c77
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60b9e74e2ddaa9d3563f200d65664a61
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8df92b47dd81e269ee3880eecfdac1ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8688d6f94ca9911d567363afecff3e9 |
| publicationDate |
2009-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-100565342-C |
| titleOfInvention |
The photoresist antireflective composition |
| abstract |
The present invention relates to a kind of novel antireflection coating composition, it contains polymkeric substance, crosslinking chemical and acid producing agent.The invention further relates to a kind of method of particularly under 193nm, using this new compositions.Polymkeric substance of the present invention contains at least a unit that is selected from structure (1), (2) and (3). |
| priorityDate |
2002-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |