| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_515262dca048e434990a1670088a10fa |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-13
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2003-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2009-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f168b7bbe189e35babb53605bc7941a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4cd46ae7f371f1470745629ac51772a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3e0ed34c1dc53ce44c84e07524ec61a |
| publicationDate |
2009-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-100565338-C |
| titleOfInvention |
What comprise the Photoactive compounds potpourri is used for the lithographic photoetching compositions of deep ultraviolet |
| abstract |
The present invention relates to a kind of novel photoetching compositions, this photoetching compositions can adopt alkaline aqueous solution to develop, and imaging under can the exposure wavelength in deep ultraviolet.The present invention also relates to should novel photoresist imaging method and novel smooth acid producing agent. |
| priorityDate |
2002-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |