| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01c1e0bc0628f76dea731cda5a666ca1 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2379-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1067
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-1071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18 |
| filingDate |
2002-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2008-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_276dba7d6a474619920f279985c946cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34d19a79f32b6d03b87e0ccb55639fbd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_246993ef4d0de455aaad714c099692f2 |
| publicationDate |
2008-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-100393783-C |
| titleOfInvention |
Polyimide film excellent in alkali etching processability and punchability |
| abstract |
A polyimide film which satisfies at least either of the following requirements: (1) the dispersion of tear propagation resistance, C<sb>H</sb>, is 1.0 g or less; and (2) the coefficient of sliminess after immersion in an alkali solution, C<sb>R</sb>, is 20.0 or less. Since the polyimide film satisfies the requirement(s), it can have improved processability. The occurrence of processing failures can be effectively prevented even during etching or punching. Thus, the productivity in each step can be improved. |
| priorityDate |
2001-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |