Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e2c4fc09095c5f3382367a33a06834fc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12Q2565-607 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-3278 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-0669 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5886 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-44704 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-413 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-44791 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-48721 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-345 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0641 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12Q1-6869 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00 |
filingDate |
2014-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0eef9fb63a6cba7919c2be0afe9b8b0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67480d9927c015f63884d8aecb598313 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0855ce4e73571f589be8efd9c35eac5 |
publicationDate |
2015-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CA-2922600-A1 |
titleOfInvention |
Nano-gap electrode and methods for manufacturing same |
abstract |
The present disclosure provides methods for forming a nano-gap electrode. In some cases, a nano-gap having a width adjusted by a film thickness of a sidewall may be formed between a first electrode-forming part and a second electrode-forming part using sidewall which has contact with first electrode-forming part as a mask. Surfaces of the first electrode- forming part, the sidewall and the second electrode-forming part may then be exposed. The sidewall may then be removed to form a nano-gap between the first electrode-forming part and the second electrode-forming part. |
priorityDate |
2013-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |