| abstract |
The subject of the invention is a material comprising a substrate (1) coated on at least a part of at least one of its faces with a stack of thin layers comprising at least two layers based on an electrically conductive transparent oxide. (2,3) separated by at least one dielectric interlayer (4) having a physical thickness of at most 50 nm, no metal layer being disposed between said electrically conductive transparent oxide layers (2). , Said stack further comprising at least one oxygen barrier layer (6) above the electrically conductive transparent oxide layer (2) furthest from the substrate (1), each layer based on an electrically conductive transparent oxide (2,3) having a physical thickness in a range of from 20 to 80 nm. |