| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9a41efd88076d610d882bee271a3cea4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-001
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2209-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-3227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-326
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2305-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-328
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2303-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-325
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-722 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F9-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-30 |
| filingDate |
2012-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_11003a3f833c7254c7f99b83d3b545f6 |
| publicationDate |
2012-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-2824856-A1 |
| titleOfInvention |
Method and system for providing ultrapure water |
| abstract |
A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. |
| priorityDate |
2011-01-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |