| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8412303829f82505584efd929e126dd0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-424
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C2059-028 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-424
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C33-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C33-40 |
| filingDate |
2010-08-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40f1aea4d835839f31a30485f1411650
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50d1c96b6a298a55451babb5fdaaeff4 |
| publicationDate |
2018-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-2768830-C |
| titleOfInvention |
Resin mold for imprinting and method for producing the same |
| abstract |
Provided is a resin mold for imprinting which is free from transfer defects, has excellent releasability from a resin subjected to imprinting, and does not cause any defect by imprinting. The resin mold for imprinting of the present invention comprises a resin layer having a recessed and projected pattern surface, an inorganic material layer formed with a uniform thickness on at least the recessed and projected pattern surface of the resin layer, and a release agent layer formed with a uniform thickness on at least the recessed and projected pattern surface of the inorganic material layer. |
| priorityDate |
2009-08-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |