http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-2579751-C
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e2e0452e5988047f97a14009657bf509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_000e2b4b4468f107c25e72c767d27597 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0236 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B33-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04 |
| filingDate | 2005-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2010-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3dbc50bd8523f2e50c3022c9d0b75f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3e88f9a16f4c63d9f4eaadd2441a096 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a9974f9597043aad930384e79122079 |
| publicationDate | 2010-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CA-2579751-C |
| titleOfInvention | Process for producing semiconductor substrate, semiconductor substrate for solar application and etching solution |
| abstract | Provided is: a process for producing safely at low cost a semiconductor substrate excellent in photoelectric transduction efficiency, in which a fine uneven structure suitable for a solar cell can be formed uniformly with desired size on the surface of the semiconductor substrate; a semiconductor substrate for solar application in which a uniform and fine pyramid-shaped uneven structure is provided uniformly within the surface thereof, and an etching solution for forming a semiconductor substrate having a uniform and fine uneven structure. A semiconductor substrate is etched with the use of an alkali etching solution containing at least one kind selected from the group consisting of carboxylic acids having a carbon number of 1 to 12 and having at least one carboxyl group in a molecule, and salts thereof, to thereby form an uneven structure on the surface of the semiconductor substrate. |
| priorityDate | 2004-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 117.