| abstract |
The invention describes microchannel reactors comprising a metal substrate having an alumina-layer, such as aluminide and catalyst metal particles directly disposed thereon, such as via thermal-growth. The catalyst may comprise a Pt/Sn atomic ratio of 1:4. Cross-flow, post-assembly and channels of complex, continuous or interior nature may be used. Methods of making catalysts in a microreactor channel, methods of making catalysts as such, methods of making a microchannel reactor and methods of conducting chemical reactions such as oxidative dehydrogenations and conversion of ethane to ethylene are also described. Superior performance, especially for high temperature reactions at high flow rates and low contact times, can be obtained from a catalyst formed by directly depositing a catalytic material onto a low surface area thermally-grown alumina layer, said layer preferably grown at a temperature from 1000-1100~C. The alumina layer is to be dense and substantially defect-free. |