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filingDate 2002-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa74b996d853cdd058fa146fc42d1326
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publicationDate 2002-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-2437886-A1
titleOfInvention Method for etching layers deposited on transparent substrates such as a glass substrate
abstract Method for electrochemical etching of a layer (11) with electrical conduction properties, of doped metal oxide type, on a transparent substrate (10) of glass type provided with a mask capable of being removed after etching, and the method consisting in : bringing at least one zone (13) to be etched of the layer into contact with an electrically conductive solution (20), immersing in the solution (20) an electrode (30) and placing it opposite and at a distance (d) from the area (13), apply an electrical voltage (U) between the electrode (30) and the layer (11) to be etched, characterized in that the electrode has an oblong shape so that etching is carried out on several areas of the layer along a width (l) of the substrate.
priorityDate 2001-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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