http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-2420243-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5fe8f1080972467feec9d73364eff51f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3432 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-246 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C25-42 |
| filingDate | 2001-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be65326ff98731707277274cbd4fda64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef3d30b916b48ebdbfff3e0c7e5c705a |
| publicationDate | 2002-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CA-2420243-A1 |
| titleOfInvention | Method and device for continuous cold plasma deposition of metal coatings |
| abstract | The invention relates to a method and a device for depositing a metal layer on a substrate (1) according to which the cold plasma deposition is carried out inside a confinement enclosure (7) heated so to avoid the formation of a metal deposit on its surface, this enclosure (7) having an inlet opening (21) and an outlet opening (22) through which the substrate (1) to be coated enters and leaves it ci, a metal vapor source, constituting an electrode, being provided in this enclosure allowing the formation of the plasma (6) in the latter, a counter-electrode being formed by the substrate (1) or by a separate electrically conductive element . The invention is characterized in that the metal, the metallic layer of which it is necessary to form on the substrate (1), is introduced in the liquid state into a retention tank (8) communicating with the enclosure confinement (7) and that the liquid metal in this tank (8) is kept at a substantially constant level during the formation of this metal layer. |
| priorityDate | 2000-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.