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filingDate 1996-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2002-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-2220354-C
titleOfInvention Method and apparatus using organic vapor phase deposition for the growth of organic thin films
abstract In a method using organic vapor phase deposition (OVPD), for the growth of thin films of organic material, a volatile precursor of each component of the organic material is carried as a vapor to a hot-wall reaction chamber by independently controlled streams of carrier gas.
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