| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-021 |
| filingDate |
1996-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_98453c9c50ab854e60970c2efc6abddb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0099b5d7f041245b60f6f3ea89a5fd73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a2e8cf323744df6fee13032fdea6918
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56a8fbac4fee33eb65ea62ab2b9f8ef3 |
| publicationDate |
1996-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-2173638-A1 |
| titleOfInvention |
Photosensitive composition and photosensitive planographic printing plate |
| abstract |
A photosensitive composition which comprises a resin (A) having urea bonds in its side chains and a photosensitive compound (B), wherein the resin (A) contains at least one resin selected from the group consisting of a vinyl polymer resin and a condensation polymer resin, provides a coating layer with excellent resistance to solvents and abrasion. The photosensitive composition is suitable for use in the production of planographic printing plates, integrated circuits (IC) or photomasks. A photosensitive planographic printing plate produced usig the photosensitive composition has superior press-life. |
| priorityDate |
1995-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |