http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-2166177-C
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5539e85987921f605c2435d0251b02b6 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2810-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2810-20 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F8-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L35-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-00 |
| filingDate | 1995-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1998-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbde74b443709c143540f0488a4fd54e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6000a80c4570dd77999813049bcbd927 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c31c50d36dda92bc40103cab6e8efab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e44311a61b941486b531d2685abe1fb9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b0d562b6dea14402030ad73759ab30d5 |
| publicationDate | 1998-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CA-2166177-C |
| titleOfInvention | Polymers and use in photoimageable compositions |
| abstract | A photoimageable composition, useful as a photoresist for forming a printed circuit board, is both alkaline aqueous developable but, subsequent to exposure and development, is processable in highly alkaline environments, such as additive plating baths and ammoniacal etchants. The photoimageable composition comprises A) between about 25 and about 75 wt% of a binder polymer, B) between about 20 and about 60 wt% of a photopolymerizeable material which is a multifunctional photopolymerizeable monomer or short chain oligomer, and C) between about 2 and about 20 wt% of a photoinitiator chemical system, the weight percentages being based on the total weight of components A)-C). The improvement is the use in the photoimageable composition of a binder polymer A) which is a styrene/maleic anhydride copolymer in which the maleic anhydride residues are mono-esterified to between about 50 and about 65 mole percent with an alkyl, aryl, cycloalkyl, alkaryl, or arylalkyl alcohol having a molecular weight greater than 100, and to between about 15 and about 50 mole percent with a C1-C3-alkyl alcohol, and to at least about 80 mole percent total. The polymer has between about 45 and about 65 mole percent styrene residues and between about 35 and about 55 mole percent maleic anhydride residues, a weight average molecular weight of between about 80,000 and about 200,000, and an acid number of between about 170 and about 220. A photoimageable composition further containing an epoxy resin and the novel polymer of the present invention is hardenable to form a solder mask. The novel polymer of the present invention provides tack-free photoimageable compositions, permitting contact imaging. |
| priorityDate | 1995-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 140.