| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6609
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-329
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-331
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-737 |
| filingDate |
1993-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7343945f71ef060006c140755ccd9161
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0b55562230f21cf0a424050ff764059 |
| publicationDate |
2001-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-2105342-C |
| titleOfInvention |
Method of forming silicon carbide |
| abstract |
A low temperature CVD method is provided for depositing high quality stoichiometric, poly-crystalline silicon carbide films and for depositing emitter quality, heavily doped silicon carbide films, suitable for application in silicon hetero-junction bipolar transistors. The process is compatible with bipolar-CMOS device processing and comprises pyrolysis of di-tern-butyl silane in an oxygen free ambient, with n-type doping provided. by phosphorus source comprising tert-butyl phosphine. Advantageously oxygen is excluded from the reactant gas mixture and the method includes pre-cleaning the substrate with nitrogen trifluoride and passivating the silicon carbide film with fluorine species from nitrogen trifluoride. |
| priorityDate |
1992-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |