Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5539e85987921f605c2435d0251b02b6 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
1993-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c2b2182fd81188f7ca835fec3b3f02c |
publicationDate |
1994-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CA-2097791-A1 |
titleOfInvention |
High aspect ratio, flexible thick film positive photoresist |
abstract |
HIGH ASPECT RATIO, FLEXIBLE THICK FILM POSITIVE PHOTORESIST Abstract of the Disclosure A crack resistant thick film positive photoresist having a thickness of from greater than 5µ to 100µ is coated as a single layer on a substrate to provide a relief structure thereon having vias in which the sidewalls are substantially vertical. The photoresist composition comprises a novolac resin, a photosensitizer, and a copolymer of an alkyl vinyl ether and an unsaturated dicarboxylic acid, ester or anhydride thereof. |
priorityDate |
1992-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |