| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c72d118f5664072de841f9c5c34b9d99 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31663
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31507 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-067 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F30-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F230-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
| filingDate |
1993-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9269966b497594c48791f74aa9e8e44a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e512d8bc61be16a2edd950f93c2a2a69 |
| publicationDate |
1993-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-2093156-A1 |
| titleOfInvention |
Abrasion resistant uv-curable hardcoat compositions |
| abstract |
PATENTS ABSTRACT OF THE DISCLOSURE A method of making a UV curable hardcoat composition uses a strip-free process and produces hardcoats having good scribed tape pull adhesion, high resistance to scratching and a low delta taber haze after abrading for 500 cycles with a 500 gram weight. UV curable hardcoat compositions are also provided which contain high solids contents and high mole percentages of photoinitiator. Compositions containing methoxypropanol as a water miscible alcohol and methylbenzoylformate as a photoinitiator exhibit high taber hardness and can be made by processes which obviate the need for a time and energy consuming solvent-strip step. The processes are not only shorter but safer than processes which include a solvent-strip step. |
| priorityDate |
1992-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |