http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-2079824-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b73bb5b611ad02b686a7967bc6ca3412 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-116 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0285 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-498 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-498 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 1992-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e5d245669f8a6d14b3b8cae40fa8165 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14cdd8cc9e0a1ab99adc133d04017990 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c22fea1e2451e93c36388521186edf0 |
| publicationDate | 1993-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CA-2079824-A1 |
| titleOfInvention | Positive-acting photothermographic materials |
| abstract | ABSTRACT POSITIVE-ACTING PHOTOTHERMOGRAPHIC MATERIALS Positive-acting photothermographic elements suitable for use at contact speeds comprising a base layer having at least two layers thereon, which layers define a photosensitive medium comprising a photocurable composition, a reducible silver source, and a reducing system for silver ion comprising one or more components including a compound capable of reducing silver ion to silver metal, such that the reducible silver source and at least one component of the reducing system for silver ion are present in separate layers, wherein exposure of the element to actinic radiation causes curing of the photocurable composition in the exposed area(s), said curing preventing the reducing system from interacting with the reducible silver source during thermal processing and in which the photocurable composition comprises a free radical curable resin and a photoinitiator therefor having an absorbance to radiation in the wavelength range of 340 to 440nm, which photoinitiator upon exposure to said actinic radiation or during subsequent thermal processing undergoes a loss of absorption in said wavelength range 340 to 440nm. |
| priorityDate | 1991-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 169.