| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1992-09-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9b0528a8ae6ad84bf0d1255548c1110
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7da8c98881b99ec8a5663dabe5c80c91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3519bddcb801454e438e2a950780a3be |
| publicationDate |
1993-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-2078830-A1 |
| titleOfInvention |
Positive type radiation-sensitive resist composition |
| abstract |
ABSTRACT OF THE DISCLOSURE A positive type radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by general formula (I): (I) wherein R1, R2 and R3 independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3. This composition is a positive type radiation-sensitive resist composition excellent in the balance between performances including resolution, sensitivity and heat resistance. |
| priorityDate |
1991-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |