Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
filingDate |
1990-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
1997-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d16a51e7ae8ecda1ae7b8de343e691ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4330bb3b6975bcedf49425ef0d8ff32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a5e6e2403b4ecd466903f09ac97e423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4e4a0429466df1e0e488f2176cab62d |
publicationDate |
1997-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
CA-2010030-C |
titleOfInvention |
Method for transferring patterns on silicone ladder type resin and etching solution used in such method |
abstract |
A method for transferring patterns on a silicone ladder type resin, which comprises: applying onto a substrate a silicone ladder type resin to be represented by the following general formula (I) (I) (where: R1 denotes a phenyl group or a lower alkyl group, and two R1's may be the same or different kinds; R2 denotes hydrogen atom or a lower alkyl group, and four R2's may be the same or different kinds; and n represents an integer of from 5 to 1,000); drying the thus applied resin layer; thereafter applying onto the resin layer a cresol novolac type positive photo-resist; forming a predetermined pattern in the photo-resist layer; subjecting the photo-resist layer to pretreatment; and finally etching the silicone ladder type resin. An etching liquid for etching a silicone ladder type resin, which comprises an aromatic type solvent. |
priorityDate |
1989-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |