http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-2003134-C

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_62f941494409aea84f621977c5f0ab81
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-155
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-86
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filingDate 1989-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1995-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8517defb575fd903e55d23dedc7a0d37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1553e74a19631641884e940f04035964
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_014f6fd0bf414d95ab5ec4f014add7c9
publicationDate 1995-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-2003134-C
titleOfInvention Solid state, quantum mechanical, electron and hole wave devices
abstract Solid state, quantum mechanical, electron or hole wave devices (100) formed from superlattice structures (120) provide, among other things, energy selectivity for substantially ballistic electron or hole wave propagation in the superlattice structures at energies above the superlattice potential energy barriers. The devices are designed by transforming designs for optical, thin film filter into designs for the semiconductor devices. The transformation, for electron wave devices, includes mapping the optical phase index into a solid state phase index which is proportional to the square root of the product of the electron kinetic energy and the electron effective mass and mapping the optical amplitude index into a second solid state amplitude index which is proportional to the square root of the electron kinetic energy kinetic energy divided by the electron effective mass. One embodiment is a tunable, biased, semiconductor superlattice, electron interference filter/emitter (1100) which can serve, for example, as a hot emitter in a ballistic transistor. Another embodiment is a semiconductor, quantum well, electron or hole slab waveguide (2100) which includes a substrate semiconductor layer (2200), a film semiconductor layer (2201), and a cover semiconductor layer (2202).
priorityDate 1988-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.