| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_28a869d6fc950d50f6df03f549ca3afa |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2371-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L71-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L81-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L65-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K81-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29K73-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29L7-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C55-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L65-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L71-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L71-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L81-02 |
| filingDate |
1988-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1993-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66ead76b24b20d2c73516a947562167c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5eade7d70bf98f071019986033693a60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0df17d58cac9baaee7e1ca255ddf6549
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51e9496444a9ae7dcef29007082ff1b2 |
| publicationDate |
1993-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-1317430-C |
| titleOfInvention |
Heat-resistant film and production process thereof |
| abstract |
ABSTRACT OF THE DISCLOSURE Disclosed herein is a heat-resistant film obtained by biaxially-stretching a composition which comprises (A) 50-90 parts by weight of a polyether-etherketone having predominant recurring units of the formula: and (B) 50-10 parts by weight of a substantially linear poly(arylene sulfide) having melt viscosity of at least 1,000 poises. A production process of such a heat-resistant film is also disclosed, which comprises biaxially stretching the above composition in a temperature range at least equal to the crystallization temperature (Tc) of the poly(arylene sulfide) but not higher than the crystallization temperature (Tc) of the |
| priorityDate |
1987-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |