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filingDate 1987-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1992-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9441b526b0591aaad1e58038138f7c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_102a11380869a8faf3f93f1ba9b146b4
publicationDate 1992-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-1307094-C
titleOfInvention Method for modifying the surface of finely divided silica
abstract METHOD FOR MODIFYING THE SURFACE OF FINELY DIVIDED SILICA Abstract In the present invention, finely divided silica is treated with two types of organosilicon compounds, (i) an organosilicon compound having the general formula wherein R is a monovalent hydrocarbon group; n is an integer having a value of 0 to 10; and Q is an alkoxy group, halogen atom, or hydroxyl group, and (ii) an organosilicon compound having the general formula (R3Si)a-Z wherein R is a monovalent hydrocarbon group; a is 1 or 2; when a eguals 1, Z is a hydrogen atom, halogen atom, hydroxyl group, alkoxy group, -NR12' -ONR12' or -OCOR1; when a equals 2, Z is -O- or -NR1-; and R1 is the hydrogen atom or an alkyl group. The present invention characteristically affords a finely divided silica which has a high dogree of surface treatment, which provides an elevated thixotropy when mixed with organo-polysiloxane, and which provides stability in long-term storage.
priorityDate 1986-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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