| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_99505f5f312672820e9f78c254c00a4d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F30-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F30-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 |
| filingDate |
1985-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1990-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0e7804421f8df150b61b28ba98d8344
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c08c058ee43866f9bf3d126f077015b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27b86f9b521c554353f1a41cf2e6f07f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac5d36f1103d954ace97312f6512288c |
| publicationDate |
1990-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-1264890-A |
| titleOfInvention |
Photosensitive film based on silicon-containing polymer and its use as a making resin in a lithography process |
| abstract |
ABSTRACT OF THE DISCLOSURE Photosensitive film usable more particularly in microlithography for producing electronic components. The film which is photosensitive in a given wavelength range comprises at least one silicon-containing polymer, at least one salt which can be converted into a Brunsted acid by irradiation and optionally at least one photosensitizer. The silicon-containing polymer-based photosensitive film can be used as a masking resin in a lithography process. B 8393.3 |
| priorityDate |
1984-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |