| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e9445e5e3626f36e932c6451a928250 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-148 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-029 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-029
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G73-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 |
| filingDate |
1984-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1988-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d18609885fc7d3ef67484bea5dbbb3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6a10d266716d6dcb4cc7a6c70d09f44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c30ec990c0186809d265e0d1374b018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33fa7c0513af3ec8aa0a7f98ee4baeaa |
| publicationDate |
1988-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-1239499-A |
| titleOfInvention |
Photopolymerisable composition, material coated therewith and process for the production of relief images |
| abstract |
Photopolymerisable composition, material coated therewith and process for the production of relief images Abstract of the Disclosure The invention relates to photopolymerisable compositions comprising (a) a prepolymer containing photopolymerisable olefinic double bonds, (b) a photoinitiator of the formula (II), wherein R1, R2 and R3 are as defined in claim 1, and optionally (c) an ester of acrylic or methacrylic acid or an allyl ether or allyl ester of a polyol. Owing to their excellent light sensitivity, these compositions are suitable for the economic production of high temperature resistant protective layers and relief structures having excellent resolution and good contours. |
| priorityDate |
1983-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |