| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-38 |
| filingDate |
1983-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1987-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9dcda3badd765f81ebf287c54249bdf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20bd913fde8930f53c24633fee28c777 |
| publicationDate |
1987-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-1225789-A |
| titleOfInvention |
Electron-beam and x-ray sensitive polymers and resists |
| abstract |
ELECTRON-BEAM AND X-RAY SENSITIVE POLYMERS AND RESISTS Abstract There are disclosed polymers, E-beam sensitive elements and resists obtained therefrom, that are more sensitive than 5 X 10-7 coulombs per cm2 when exposed to a 15 keV electron beam. The polymers are copolymers of either allyl or propargyl methacrylate and of an acrylate or methacrylate bearing an oxygen-containing heterocyclic ring. |
| priorityDate |
1983-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |