| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3997407790a9cf7baf4143c77f4361d6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2111-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3217
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-72 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6303
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-65 |
| filingDate |
1983-05-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1986-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cd6c32614f30abef0173e32e520a7ca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd9f2d00d997d39b5d7640d42bdbd211 |
| publicationDate |
1986-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-1203254-A |
| titleOfInvention |
Nitride bonded oxide refractories |
| abstract |
Nitride Bonded Oxide Refractories Abstract This invention relates to a method for producing nitride bonded refractory shapes in which the bonding matrix is formed in situ. The method comprises forming a batch including a coarser portion selected from the group calcined and fused aggregates of alumina, aluminosilicate, and magnesium aluminate spinel and a finer portion consisting essentially of finely divided silicon metal and alumina. The silicon metal and alumina react in the nitriding atmosphere to form a low porosity matrix generally comprising silicon oxynitride with corundum distributed therethrough. |
| priorityDate |
1982-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |