http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-1185056-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D1-00
filingDate 1982-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1985-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb19271b9d03dd85b83b9258aed8f506
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_913d3644026597818b8c3fe047046364
publicationDate 1985-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-1185056-A
titleOfInvention Method for formation of coating film of silicon oxide
abstract Abstract: The invention provides a method for the formation of a coating film of silicon oxide on the surface of an inorganic substrate by applying a coating composition comprising a silicon compound onto the surface to form a coating composition layer, and then subjecting the surface having the coating composition layer thereon to a heat treatment to form a coating film of silicon oxide. The coating composition comprises a polar organic solvent having silicic acid dissolved therein, the molar ratio of water to silicic acid therein being not more than 5. The coating film thus formed is uniform and does not have any pinholes or cracks.
priorityDate 1982-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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