http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-1165164-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5c24684033fba97d1ad845ce453a57e3
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
filingDate 1981-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1984-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7992aef4963aadc59a7ea9d4f0ef6f4
publicationDate 1984-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-1165164-A
titleOfInvention Developing exposed negative-working diazonium salt layers using a mixture containing salt of an alkanoic acid and a block copolymer of ethylene and propylene oxides
abstract Abstract of the Disclosure The invention relates to a developer mixture for developing exposed, light-sensitive reproduction layers which contain a dia-zonium salt polycondensation product. The mixture comprises water, a salt of an alkanoic acid and a surfactant and contain 0.5 to is percent by weight, in particular 1 to 10 percent by weight, of at least one salt of an alkanoic acid having 8 to 13 carbon atoms and 0.5 to 20 percent by weight, in particular 1 to 12 percent by weight, of at least one low-foaming, nonionic sur-factant. These surfactants preferably include optionally modified block polymers formed from ethylene oxide and propylene oxide. The invention also relates to a process for developing negative-working reproduction layers, of the composition indicated above, with the developar mixture according to the invention.
priorityDate 1981-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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