| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1803
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1980-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1984-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_08056b293cc9baae3a73c09ec6e4f29e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa7c3e11b661cd0141017575650e66cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8cab6ff79948f228ab698a48f72623f2 |
| publicationDate |
1984-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-1161192-A |
| titleOfInvention |
Negative-working polymers useful as electron beam resists |
| abstract |
Abstract . Novel acrylate copolymer material function as electron-beam resists with enhanced sensitivity and enhanced plasma etch resistance. The method of using such materials as an electron-beam resist is also described. |
| priorityDate |
1980-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |