http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-1155326-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1981-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 1983-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f1f9fb92a632ad6aa8e43c1dbcabb5f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ec595a88d4484192fa781eff9664fe8 |
publicationDate | 1983-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CA-1155326-A |
titleOfInvention | Process for forming a patterned resist mask using a developer containing an organic complexing agent and a transition metal ion |
abstract | Process for Forming a Patterned Resist Mask Abstract The performance of ethylene glycol alkylether de-velopers, for positive methacrylate-methacrylic acid copolymer and terpolymer resists, is controlled by add-ing an organic complexing agent, such as citric acid, or a combination of a transition metal salt and a com-plexing agent, such as ammonium citrate, to the de-veloper. The additives provide a consistent develop-ment rate, so that the maximum difference between the dissolution rates of the exposed and unexposed portions of the resist layer can be maintained, regardless of the developer purity. |
priorityDate | 1980-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 52.