http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-1154759-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_19219be1910bdd13416a9e12935176a9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-016 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-016 |
| filingDate | 1980-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1983-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25d5a1f7f35e1f7c9637c9df8ade6cbe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4219e02b6a6bb797cadc209c605c4b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e395f6fd24a62ef446289e7e3cd49a8 |
| publicationDate | 1983-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CA-1154759-A |
| titleOfInvention | Radiation-sensitive compounds |
| abstract | IMPROVEMENTS IN OR RELATING TO RADIATION SENSITIVE COMPOUNDS ABSTRACT OF THE DISCLOSURE A radiation sensitive compound contains at least two groups having the structure A N2+ - Ar - R - X - ? - X'-in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X' which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X' is an imino group; Y represents O or S; R represents a single bond or a divalent or other polyvalent radical and A- is an anion. Radiation sensitive compositions comprising the compound and optionally a resin may be used to produce radiation sensitive plates for lithographic printing plate production. |
| priorityDate | 1979-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 101.