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filingDate 1980-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1983-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1983-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-1147195-A
titleOfInvention Positive working photosensitive film resist material including a polymer with aromatic o-nitro carbinol ester groups and a plasticizer
abstract O.Z. 0050/033896 ABSTRACT OF THE DISCLOSURE: A positive working photosensi-tive film resist material suitable for multiple image-wise exposure comprises, on a dimensionally stable base film, a photosensitive coating which contains (a) a polymer which possesses aromatic or hetero-aromatic o-nitrocarbinol ester groups (for example o-nitrobenzyl acrylate units) and which can be washed out, after exposure, with an alkaline solvent, and (b) a transparent plasticizer compatible with (a). The product may be used as photopolymer dry film resist material in the production of electrical conductor boards, chemically milled fine-line parts, and identification plates.
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