http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-1106544-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F118-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-74 |
| filingDate | 1980-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 1981-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_26031141e227c65c1bb4ffa07330c263 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20bd913fde8930f53c24633fee28c777 |
| publicationDate | 1981-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CA-1106544-A |
| titleOfInvention | Acid-resistant copolymer and photographic element incorporating same |
| abstract | A photocrosslinkable polymer and imaging element containing said polymer are described wherein acid resistance is achieved by vinyl ester recurring units. A process for etching an element so prepared features exposure, development, and etching in an acid bath. |
| priorityDate | 1976-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 112.