abstract |
ABSTRACT OF THE DISCLOSURE Process for the manufacture of new azatetracyclic compounds of the formula (I) wherein R1 represents hydrogen, lower alkyl, cycloalkyl-lower alkyl of not more than 10 carbon atoms, lower alkenyl, lower alkynyl, (di-lower alkylamino)-lower alkyl, hydroxy lower alkyl, alkoxy lower alkyl, alkanoyloxy lower alkyl, lower alkylthio-lower alkyl, phenyl-lower alkyl, or phenyl-lower alkyl substituted by halogen with an atomic number up to 35, lower alkyl, lower alkoxy, methylenedioxy, or trifluoromethyl, the ring A is unsubstituted or substituted by halogen with an atomic number up to 35, lower alkyl, hydroxyl, lower alkoxy, alkanoyloxy, lower alkylthio, trifluoromethyl or cyano, Y represents a direct bond, Z represents vinylene and X represents O, S, methylene, a direct bond or a divalent radical of the partial formula (Ia) in which R3 represents hydrogen or lower alkyl, or Y represents a direct bond, Z represents S and X represents a direct bond or S, and acid addition salts thereof. The novel compounds possess valuable pharmaceutical properties and can be used as tranquillizing, antipsychotic and excitation-inhibiting compounds for the treatment of states of agitation. |