http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-1083747-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-52 |
filingDate | 1977-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 1980-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bbdc4b65661b367b42dc02e15b13668 |
publicationDate | 1980-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CA-1083747-A |
titleOfInvention | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life |
abstract | ABSTRACT A process is disclosed for inhibiting in a polymerization reaction crosslinking of photocrosslinkable condensation homopolymers and copolymers by use of a synergisti inhibitor composition comprising specified amounts of a hindered phenolic compound and a phosphoric acid ester in the presence of monomers from which said homopolymers and copolymers are formed. Residue from the inhibitor composition remains in the polymeric product and serves as a stabilizer against heat deterioration and premature cross-linking or the product during recovery and storage, The stabilized homopolymers and copolymers are useful for manufacture of radiation sensitive elements. Photographic elements formed from the stabilized condensation polymers are particularly useful as lithographic plates. |
priorityDate | 1976-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 289.