http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CA-1071936-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_584dce0e6fca1f9f5e683364b14d3d9f
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0084
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-228
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B13-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01G4-33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-08
filingDate 1975-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 1980-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60bb13ff09374c408bc228e7979d980a
publicationDate 1980-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CA-1071936-A
titleOfInvention Method and apparatus for depositing thin layers of insulating or slightly conductive materials by reactive spraying in a high-frequency inductive plasma
abstract ABSTRACT OF THE DISCLOSURE: A method and apparatus for depositing thin layers of insulating or slightly conductive materials involves reactive spraying through high-frequency inductive plasma. The conduc-tive component of the material to be deposited is sprayed in a first chamber through which an ionizable inert gas travels, the sprayed particles then passing through a second chamber in which a substrate is placed and to which a reactive gas is supplied. Insulating and weakly inductive materials such as oxides, car-bide and nitrides may be deposited at a rate substantially com-parable with the rate for conductive materials to obtain high qualify uniform deposits.
priorityDate 1974-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 22.