| abstract |
ABSTRACT Disclosed are polyene compounds of the general formula (I) ,wherein one of the symbols R1 and R2 represents a halogen atom or a lower alkyl group and the other symbol repre-sents a halogen atom or a lower alkoxy group, the symbols R3 and R5 each repre-sent a halogen or halogen atom or a lower alkyl group with the proviso that one of the symbols R3 and R5 represents other than a halogen atom, the symbol R4 represents a lower alkoxy group and the symbol R6 represents a carboxyl, lower alkoxycarbonyl, or mono(lower alkyl)carbamoyl group, and salts thereof, as well as a process for the manufacture of these compounds and salts, which are useful for the prophylaxis and therapy of benigen and malignant neoplasia and of premalignant lesions and of acne and psoriasis. |