| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G75-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G75-00 |
| filingDate |
1975-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
1978-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f78447e696b9c5ce07ec4250d074018f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0d690cdb16cb7bacf6b8638e9aeb5fc |
| publicationDate |
1978-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CA-1041347-A |
| titleOfInvention |
Terpolymers containing sulfur dioxide for electron beam positive resists |
| abstract |
TERPOLYMERS FOR ELECTRON BEAM POSITIVE RESISTS Abstract of the Disclosure Electron beam positive resists are formed from terpolymers of (a) an alpha olefin, (b) sulfur dioxide, and (c) a compound selected from the group consisting of cyclopentene, bicyclo-heptene and methyl methacrylate. The terpolymers have the particular unexpected advantage of being resistant to cracking of the films. |
| priorityDate |
1974-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |