http://rdf.ncbi.nlm.nih.gov/pubchem/patent/BR-PI0713571-A2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2be22659af828fe9bc0bca9ebd23fcd2 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F9-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-3272 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C12Q1-001 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-487 |
| filingDate | 2007-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9fdf1afc68e8e4899e635d109d16a4d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_668205491aa567ef06f566e6d6489c8e |
| publicationDate | 2012-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | BR-PI0713571-A2 |
| titleOfInvention | biosensor, coil and their manufacturing methods |
| abstract | BIOSSENSOR, COIL AND RESPECTIVE MANUFACTURING METHODS. a method of manufacturing a biosensor is provided. The method may include placing a shadow mask containing a pattern of a plurality of feature sets on a substantially flat base layer containing a plurality of registration points. The method may also include forming at least one of the plurality of feature sets on the substantially flat base layer by selectively depositing a layer of a conductive metal over the substantially flat base layer by passing the conductive material over the substantially flat base layer by passing the material conductor through the shade mask pattern from the substantially flat base layer. Alternatively, the method may include providing a laminated structure that includes a substantially flat base layer containing a plurality of registration points and a photoresist layer containing a pattern of a plurality of feature sets. The method may further include forming at least one of the plurality of sets of characteristics. The method may further include forming at least one of the plurality of feature sets on the substantially flat base layer by selectively depositing a layer of a conductive material on the substantially flat base layer by passing the conductive material through the photoresist layer pattern and removing the layer photoresist from the substantially flat base layer. |
| priorityDate | 2006-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 102.