| abstract |
"method for forming a transistor, transistor, and logic circuit and display or memory device". One method of forming a transistor comprises: depositing a first solution material in a first solvent to form a first transistor layer, and subsequently while the first material remains soluble in the first solvent, forming a second transistor layer depositing over the first material. a second material from solution in a second solvent in which the first material is substantially insoluble. |