abstract |
The present invention relates to a method of treating a product (214, 314) or surface with a reactive gas (210, 408) which comprises producing the reactive gas (210, 408) forming a high voltage cold plasma (HVCP ) from a working gas; transport the reactive gas (210, 408) at least 5 cm away from the HVCP; followed by contact of the product (214, 314) or surface with the reactive gas (210, 408). HVCP does not contact the product (214, 314) or surface. |