http://rdf.ncbi.nlm.nih.gov/pubchem/patent/BR-0311399-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24da3df7f59e02bdbdecde92eb1aa6a8 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28 |
| filingDate | 2003-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73889fff6286b1a6fe324fc6943cd627 |
| publicationDate | 2005-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | BR-0311399-A |
| titleOfInvention | Radiation-sensitive compositions containing acid-generating polymeric sulfonates and their use in image reproduction |
| abstract | "RADIATION-SENSITIVE COMPOSITIONS CONTAINING ACID GENERATING POLYMERIC SULPHONATES AND THEIR USE IN IMAGE REPRODUCTION". The invention relates to a radiation sensitive embossing composition, comprising: (1) at least one acid generating compound selected from compounds of formula (I) and formula (II), wherein: R 1, R 2 ~, R ~ 3 ~, R ~ 4 ~, R ~ 5 ~ and R ~ 6 ~ are independently selected from the group consisting of hydrogen, nitro, hydroxyl, carbonyl, halogen, cyano, unsubstituted and substituted alkyl groups, unsubstituted and substituted cycloalkyl; unsubstituted and substituted alkoxy groups; and unsubstituted and substituted aryl groups; where: X 4 + 4 is an onium ion selected from the group consisting of diazonium, iodonium, sulfonium, phosphonium, bromonium, chloronium, oxysulfoxonium, oxysulfonium, sulfoxonium, selenium, tellurium and arsenic; and n is an integer between 4 and 100; (2) at least one acid crosslinkable crosslinker; (3) at least one polymeric compound capable of reacting with the crosslinking agent; and (4) at least one infrared absorbent compound. |
| priorityDate | 2002-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.