| abstract |
Disclosed are a salt, capable of producing a resist pattern with satisfactory CD uniformity (CDU), an acid generator and a resist composition. Disclosed is a salt represented by formula (I) as defined in claim 1, wherein Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; R11 and R12 each represent a hydrogen atom, a fluorine atom or a perfluoroalkyl group; z represents an integer from 0 to 6; X1 and X2 each independently represent *-CO-O-, *-O-CO-, etc.; L1 represents a single bond or a hydrocarbon group which may have a substituent; A1 represents a group having a lactone structure which may have a substituent; L2 and L3 each represent a single bond or an alkanediyl group; R1 represents an iodine atom or a haloalkyl group; R2 represents a halogen atom, a hydroxy group, a haloalkyl group or an alkyl group; m2 represents an integer from 0 to 4; and Z+ represents an organic cation. |