abstract |
An object of the present invention is to provide a salt and a resist composition comprising the salt capable of producing a resist pattern with satisfactory CD (CDU) uniformity. The invention relates to a salt represented by formula (I) as defined in claim 1, an acid generator and a resist composition which comprise the salt, wherein, in formula (I), R1 represents a fluorine or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, -CH2- included in the group may be replaced by -O- or -CO-, and a hydrogen atom included in the group may be substituted by a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent. |