| abstract |
An object of the present invention is to provide a resin capable of producing a resist pattern with satisfactory line edge roughness (LER), and a resist composition comprising the resin. Disclosed is a resin comprising the structural unit represented by the formula (I), and a structural unit represented by the formula (a1-1) and/or a structural unit represented by the formula (a1-2), such as defined in claim 1 and a resist composition comprising this resin, wherein, in the formula (I), the formula (a1-1) and the formula (a1-2), wherein R1, Ra4 and Ra5 each represent an atom of hydrogen or a methyl group, X1 represents a single bond or -CO-O-*, X2 represents -CO-O-*, -O-* or the like, Ar1 and Ar2 each represent an aromatic hydrocarbon group which may have a substituent, R2 each represents a hydrogen atom, an acid labile group and the like, n represents an integer of 1 to 3, La1 and La2 each represent -O- or * -O-(CH2)k1-CO-O-, k1 represents an integer of 1 to 7, Ra6 and Ra7 each represent an alkyl group, an alicyclic hydrocarbon group, a group obtained by combining these groups or the like, m1 represents an integer from 0 to 14, n1 represents an integer from 0 to 10, and n1' represents an integer from 0 to 3. |