| abstract |
The present invention relates to a salt capable of producing a resist pattern with satisfactory line edge roughness (LER) as well as a resist composition comprising the same. Described are a salt represented by formula (I) as defined in claim 1, a quencher or quencher and a composition including them wherein, in formula (I), R1, R 2, R 3 and R 4 represent each a halogen atom, an alkyl fluoride group having 1 to 6 carbon atoms or a hydrocarbon group having 1 to 18 carbon atoms, -CH2- included in the hydrocarbon group may be replaced by -O- or -CO -; and m1, m2, m3 and m4 represent an integer of 0 to 4, and when m1 is equal to or greater than 2, a plurality of R1 may be the same or different from each other, and when m2 is equal to or greater than 2, a plurality of R2 may be the same or different from each other, and when m3 is equal to or greater than 2, a plurality of R3 may be the same or different from each other, and when m4 is equal to or greater than 2, a plurality of R4 may be the same or different from each other. |