http://rdf.ncbi.nlm.nih.gov/pubchem/patent/BE-1027509-A9
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D409-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D335-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-06 |
| filingDate | 2020-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5a0f29773a00a81cffeccef5e6a21c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e4077fd8e9b49685b0dc5de75c94603 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
| publicationDate | 2021-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | BE-1027509-A9 |
| titleOfInvention | SALT, DEACTIVATION AGENT, COMPOSITION OF RESIST AND METHOD FOR PRODUCING A PATTERN OF RESIST |
| abstract | The present invention relates to a salt capable of producing a resist pattern with a satisfactory Mask Error Factor (MEF) and a resist composition comprising the salt. Described are a salt represented by formula (I) as defined in claim 1, a quencher or quencher and a composition including them wherein, in formula (I), R1 represents a halogen atom, a fluoride group alkyl or a hydrocarbon group, and -CH2- included in the hydrocarbon group may be replaced by -O- or -CO-; R2 and R3 each independently represent a halogen atom, an alkyl fluoride group or a hydrocarbon group, -CH2- included in the hydrocarbon group may be replaced by -O- or -CO-, or R2 and R3 may be linked to each other to form a single bond or an alkanediyl bridge with the carbon atoms to which R2 and R3 are attached, and -CH2- included in the alkanediyl bridge can be replaced by -O-, -S-, - CO-, -SO- or -SO2-; m1 represents an integer of 0 to 3; m2 and m3 represent an integer of 0 to 4; R4, R5 and R6 each independently represent a hydrogen atom or -X2-R7, wherein at least one of R4, R5 and R6 represents -X2-R7, X2 represents * -CO-O-, * -O -CO- or the like; and R7 represents a hydrocarbon group comprising a cyclic hydrocarbon group (-CH2-included in the group may be replaced by -O-, -S- or the like). |
| priorityDate | 2019-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 239.